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Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Home ProductsNiobium Alloys

8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

Large Image :  8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

Product Details:
Place of Origin: Luoyang Henan, China
Brand Name: Forged
Certification: ISO9001:2008
Model Number: customized
Payment & Shipping Terms:
Minimum Order Quantity: 1 kg
Price: can be negotiate
Packaging Details: Standard wooden case with foam sheet inside
Delivery Time: 1-30 days
Payment Terms: T/T, Western Union, MoneyGram,, L/C, D/P, D/A
Supply Ability: 50MT/month
Detailed Product Description
Brand: Forged Material: Niobium
Density: 8.6g/cm3 Purity: Over 99.95%
Highlight:

8.6g/Cm3 Niobium Alloys

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Niobium Sputtering Target For Semiconductor

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Niobium Alloys For Semiconductor

niobium target purity 99.95% merchandise on hand customization

 

Niobium Target Introduction
With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widely used in coating industry, electronics industry, steel industry, chemical industry, optics, gemstone manufacturing, superconducting technology, aerospace. technology and other fields. Niobium target and sheet is the most common form of Nb product.
Niobium Target Production Technology

Refined by electron-beam, niobium targets are produced from niobium ingots. The target fabrication includes: mechanical deformation, machining (trimming and plane milling), vacuum re-crystallization annealing and finishing chemical treatment.

Higher density of target material is usually required in order to reduce the stomata in the material and improve the performance of the sputter film. The density affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the density of target material is, the better the film performance works.

In addition, enhancing density and strength of the target material can withstand the thermal stress better during the sputtering process. Density is also one of the key performance indicators of the target material.

 

Commodity Name 99.95% High Purity Niobium Disc
Size  customizable
Surface Polish and bright
Purity 99.95%
Density 8.6g/cm3
Application Steel, superconducting material, aerospace, atomic energy, etc
Advantage

1) good superconductivity material

2) Higher melting point

3) Better Corrosion Resitance

4) Better wear-resisting

Technology Powder Metallurgy
Lead time  according to the quantity and material

Contact Details
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.

Contact Person: Ms. Jiajia

Tel: 15138768150

Fax: 86-0379-65966887

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